Wafer Cleaning

 

Wafer cleaning is the most frequently repeated process in semiconductor manufacturing. The aim is to remove particles or chemicals from the wafer. Wet Bench is the most popular cleaning process where the wafers are immersed in a bath of chemicals such as acids, solvents or de-ionized water. Benefits include high productivity and minimal contamination.

 

It was also found during a study that alkaline solutions are superior to acid solutions in terms of particle removal efficiency. Other ry clean� or emi-aqueous� methods use vapors, sprays, or dry processes for cleaning. However, these alternatives are beneficial for specific cleaning steps