Process Chemicals Gas And Water

 

These chemicals range from high-purity cleaning solvents (e.g., tetra methyl ammonium hydroxide and methanol) to complex organic mixtures (post-etch cleaners, photoresist, etc.) and highly volatile solvents such as acetone. Other important chemicals include: hydrofluoric acid, hydrochloric acid, sulfuric acid, hydrogen peroxide, isopropyl alcohol, and phosphoric acid.

 

A new sulfur trioxide (SO3) gas-phase cleaning process was developed to remove residual photoresist and organic polymers through a simple, two-step exposure to SO3 followed by a de-ionized water rinse.De-ionised water used in semiconductor manufacturing is produced by removing all ions of dissolved minerals using reverse osmosis and ion exchange systems. It should also be free from particles, bacteria, organics, and dissolved oxygen; purity of de-ionized water is determined based on its resistivity.